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首页> 外文期刊>Ultramicroscopy >Calibration for medium resolution off-axis electron holography using a flexible dual-lens imaging system in a JEOL ARM 200F microscope
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Calibration for medium resolution off-axis electron holography using a flexible dual-lens imaging system in a JEOL ARM 200F microscope

机译:在JEOL ARM 200F显微镜中使用灵活的双镜头成像系统对中分辨率离轴电子全息图进行校准

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摘要

In this work the calibration of a medium resolution off-axis electron holography using a dual-lens imaging system in a JEOL ARM 200F is shown. The objective dual-lens configuration allows adjusting the field of view from 35 nm to 2.5 um. Subsequently, the parameters used in phase shift reconstruction were calibrated considering biprism voltage versus fringe spacing (a) and versus fringe width (W). The reliability of the transmission electron microscope performance using these parameters was achieved using gold nanoparticles of known size and adjusting the excitation voltage of the lenses.
机译:在这项工作中,显示了在JEOL ARM 200F中使用双镜头成像系统对中分辨率离轴电子全息图的校准。客观的双镜头配置允许将视场从35 nm调整到2.5 um。随后,考虑到双棱镜电压与条纹间距(a)和条纹宽度(W)的关系,对相移重建中使用的参数进行了校准。使用这些参数的透射电子显微镜性能的可靠性是通过使用已知尺寸的金纳米颗粒并调节透镜的激发电压来实现的。

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