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首页> 外文期刊>Plant Physiology and Biochemistry >Acclimation of Arabidopsis thaliana to low temperature protects against damage of photosystem II caused by exposure to UV-B radiation at 9 degrees C
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Acclimation of Arabidopsis thaliana to low temperature protects against damage of photosystem II caused by exposure to UV-B radiation at 9 degrees C

机译:将拟南芥的适应驯化到低温保护通过暴露于9摄氏度的UV-B辐射引起的照相损伤

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Various environmental variables interact with UV-B radiation (280-315 nm), among them temperature. In many plants epidermal UV screening is induced by low temperature even in the absence of UV irradiation. On the other hand, low temperature can aggravate damage caused by UV-B radiation. We investigated the interaction of UV-B radiation and low temperature in Arabidopsis thaliana (L.) Heynh. Exposure of plants grown at moderate temperature (21 degrees C) to UV-B radiation at 9 degrees C resulted in significantly higher damage of photosystem II (PS II) as compared to exposure at 21 degrees C. The higher damage at low temperature was related to slower recovery of maximal PS II quantum efficiency at this temperature. Epidermal UV-B transmittance was measured using a method based on chlorophyll fluorescence measurements. Acclimation to low temperature enhanced epidermal UV-B screening and improved the UV-B resistance considerably. Differences in the apparent UV-B sensitivity of PS II between plants grown in moderate or acclimated to cool temperatures were strongly diminished when damage was related to the UV-B radiation reaching the mesophyll (UV-B-int) as calculated from incident UV-B irradiance and epidermal UV-B transmittance. Evidence is presented that the remaining differences in sensitivity are caused by an increased rate of repair in plants acclimated to 9 degrees C. The data suggest that enhanced epidermal UV-B screening at low temperature functions to compensate for slower repair of UV-B damage at these temperatures. It is proposed that the UV-B irradiance reaching the mesophyll should be considered as an important parameter in experiments on UV-B resistance of plants.
机译:各种环境变量与UV-B辐射(280-315nm)相互作用。在许多植物中,即使在没有UV照射的情况下,通过低温诱导表皮紫外线筛选。另一方面,低温可以加剧UV-B辐射引起的损伤。我们研究了乌拉米多组(L.)Heynh中UV-B辐射和低温的相互作用。在9摄氏度下,在中等温度(21摄氏度)中生长的植物暴露于UV-B辐射,与21摄氏度暴露相比,照相系统II(PS II)的损伤显着较高。低温损害较高有关在该温度下越慢地恢复最大PS II量子效率。使用基于叶绿素荧光测量的方法测量表皮UV-B透射率。适应低温增强表皮UV-B筛选并显着改善了UV-B电阻。当损伤与从事故UV-计算出来的UV-B辐射有关时,在中等或适应凉爽的温度下生长的植物之间的PS II的表观UV-B敏感性的差异强烈地降低了。 B辐照度和表皮UV-B透射率。提出了证据表明敏感性的剩余差异是由于植物的修复率增加到9摄氏度造成的。数据表明,在低温函数下增强表皮UV-B筛选以补偿UV-B损伤的较慢修复这些温度。提出,达到叶蛋白的UV-B辐照度应该被认为是植物UV-B抗性实验中的重要参数。

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