首页> 外文期刊>Philosophical magazine: structure and properties of condensed matter >Electric field induced non-linear multisubband electron mobility in V-shaped asymmetric double quantum well structure
【24h】

Electric field induced non-linear multisubband electron mobility in V-shaped asymmetric double quantum well structure

机译:电场诱导的V形不对称双量子阱结构中的非线性多管电子迁移率

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

We study the effect of the external electric field Fext on the low-temperature electron mobility μ in an asymmetrically doped Al_xGa_(1-x)As based V-shaped double quantum well (VDQW) structure. We show that nonlinearity of μ occurs under double subband occupancy on account of intersubband effects. The field F_(ext) alters the VDQW potential leading to transfer of subband wave functions between the wells, which affects the scattering potentials and hence μ. In the VDQW structure, due to the alloy channel layer, the alloy disorder (Al-) scattering happens to be significant along with the ionised impurity (Imp-) scattering. The non-linear behaviour of μ is because of μ~(Imp), while the overall magnitude of μ is mostly due to μ~(Al). The increase of difference in the doping concentrations of the outer barriers increases the nonlinearity of μ. The oscillatory character of μ is amended by varying the width of the well and barrier and also the height of the VDQW. Our results can be used to study VDQW based nanoscale field effect transistor structures.
机译:我们研究了基于基于V形双量子阱(VDQW)结构的非对称掺杂AL_XGA_(1-X)中的低温电子迁移率μ的外电场FEXT的效果。我们表明,由于步骤带效应,我们在双子带占用时出现了μ的非线性。字段F_(ext)改变了VDQW电位,导致井之间的子带波函数的转移,这影响散射电位并因此μ。在VDQW结构中,由于合金沟道层,合金障碍(AL-)散射恰好与电离杂质(Imp-)散射相同。 μ的非线性行为是因为μ〜(否),而μ的总大小主要是由于μ〜(Al)。外屏障的掺杂浓度的差异的增加增加了μ的非线性。通过改变井和屏障的宽度以及VDQW的高度来修改μ的振荡特性。我们的结果可用于研究基于VDQW的纳米级场效应晶体管结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号