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High-pressure, high temperature insertion of bismuth in the siliceous zeolite silicalite-1

机译:高压,高温插入硅藻土硅晶体-1中的铋

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A silicalite-1/bismuth composite was synthesized by insertion of liquid bismuth in the 5.5 angstrom diameter pores of the zeolite under high-pressure, high-temperature conditions. The insertion of bismuth stabilizes the structure with respect to pressure-induced amorphization. Transmission electron microscopy indicated the presence of chains of atoms, which correspond to the 5.5 angstrom diameter of the host silicalite-1 structure. Neutron powder diffraction also confirmed the insertion of Bi in the pores of silicalite-1. Density functional theory calculations indicate that the insertion of bismuth results in formation of chains with short and long Bi-Bi distances in the pores of the host silicalite-1 linked to the framework by van der Waal's interactions. The material is predicted to be a semiconductor with a band gap of 0.4 eV.
机译:通过在高压,高温条件下在沸石的5.5埃直径孔中插入液体铋来合成硅沸石-1 /铋复合物。 铋的插入稳定在压力诱导的杂化方面的结构。 透射电子显微镜表明存在原子链,其对应于宿主硅藻土1结构的5.5埃直径。 中子粉衍射还证实了BI在硅沸石-1的孔中的插入。 密度函数理论计算表明,铋的插入导致在载体硅藻土1的孔隙孔中形成链的链条和长的Bi-Bi距离,与van der Waal的相互作用相连。 预测材料是具有0.4eV的带隙的半导体。

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