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首页> 外文期刊>Solid state sciences >Asymmetric-dimer reconstruction and semiconducting properties of Mg2Si (100) surfaces: Prediction from meta-GGA and hybrid functional study
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Asymmetric-dimer reconstruction and semiconducting properties of Mg2Si (100) surfaces: Prediction from meta-GGA and hybrid functional study

机译:Mg2Si(100)表面的不对称二聚体重建和半导体性能:Meta-GGA和杂交功能研究的预测

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摘要

Mg2Si is an important semiconducting silicide material with promising applications in optoelectronics, thermoelectrics, and photovoltaics. Mg2Si(001)-(1 x 1) surfaces have been suggested to be metallic from density functional (DFT) studies performed within local density (LDA) and generalized gradient approximations (GGA). Here in this article, we revisit and further explore surface electronic structure, surface reconstruction and stability of Mg2Si(100) surfaces within DFT framework in combination with Heyd-Scuseria-Ernzerhof (HSE06) hybrid functional as well as Tran-Blaha (TB09) meta-GGA functional for exchange-correlation. Our results suggest that reconstructed Mg2Si(100) surfaces are semiconducting which are incorrectly found as metallic in absence of reconstructions with higher surface periodicities and when computed within LDA (GGA) approximations. In particular, the Si-terminated Mg2Si(100) surface exhibits (2 x 1) reconstruction qualitatively similar to buckled asymmetric dimer type reconstruction of Si(100)-(2 x 1) surface. The band gap of Mg-terminated relaxed Mg2Si(100)-(1 x 1) and reconstructed Siterminated Mg2Si(100)-(2 x 1) surfaces are found to be in the range similar to 0.3-0.5 eV. The Si-terminated reconstructed (2 x 1) surface is found to be lower in energy by similar to 0.21 J/m(2) than the (1 x 1) relaxed surface. Further, localized surface states are formed in the band gap near valence band maximum (VBM) as well as at similar to 7 eV below the VBM depending on the surface termination. The surface localized gap states may be expected to have important implications for relaxations and thermodynamic energies of Mg2Si(100) surfaces.
机译:MG2SI是一种重要的半导体硅化物材料,具有希望在光电子,热电和光伏中的应用。已经提出Mg2Si(001) - (1×1)表面是从局部密度(LDA)和广义梯度近似(GGA)内进行的密度官能(DFT)研究的金属。在本文中,我们重新审视和进一步探索DFT框架内MG2SI(100)表面的表面电子结构,表面重建和稳定性,以及Heyd-Scuseria-Ernzerhof(HSE06)混合功能以及Tran-Blaha(TB09)Meta -gga功能用于交换相关性。我们的结果表明,重建的MG2SI(100)表面是半导体,其在没有具有较高表面周期性的重建并且在LDA(GGA)近似时的重建而被错误地发现为金属。特别地,Si封端的Mg2Si(100)表面表现出(2×1)重建定性类似于Si(100) - (2×1)表面的弯曲的不对称二聚体类型重建。发现Mg封端的弛豫Mg2Si(100) - (1×1)和重建的型号Mg2Si(100) - (2×1)表面的带隙在于类似于0.3-0.5eV的范围。发现Si封端的重建(2×1)表面在能量中较低,而不是比(1×1)松弛表面更低。此外,局部表面状态形成在价隙最大(VBM)附近的带隙中,以及根据表面终端在VBM下方类似于7eV。可以预期表面局部间隙状态对于Mg2Si(100)表面的弛豫和热力学能量具有重要意义。

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