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首页> 外文期刊>Smart Materials & Structures >An experimental analysis of strontium titanate ceramic substrates polished by magnetorheological finishing with dynamic magnetic fields formed by rotating magnetic poles
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An experimental analysis of strontium titanate ceramic substrates polished by magnetorheological finishing with dynamic magnetic fields formed by rotating magnetic poles

机译:用旋转磁极形成的动态磁场抛光钛酸锶陶瓷基材的实验分析

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摘要

Strontium titanate (SrTiO3, STO) ceramic substrate is an incipient ferroelectric material with a perovskite structure and which has a wide range of applications in the fields of microwave, millimetre wave, and optic fibre. This paper reports on a system of experiments carried out on STO substrates using a new magnetorheological (MR) finishing process where dynamic magnetic fields are formed by magnetic poles rotate. The results show that a circular ring shaped polishing belt with a stability evaluation zone appears on the surface after being polished by MR finishing with a single-point dynamic magnetic field. The dynamic magnetic fields are stronger when the revolutions of magnetic pole increase and eccentricity of pole enlarge, with the surface finish is smoother and more material is removed. The optimum machining times, machining gap, oscillation distance, eccentricity of pole, revolutions of the workpiece and magnetic pole are 60 min, 0.8 mm, 0 mm, 7 mm, and 350 r min(-1) and 90 r min(-1), respectively, and the best MR fluid consists of 6 wt% of diamond abrasives in W1 particle size and 18 wt% of carbonyl iron powder in W3.5 particle size. A surface roughness of Ra and a material removal rate of 8 nm and 0.154 mu m min(-1) can be obtained in these optimum process conditions. Finally, the polishing mechanism for dynamic magnetic fields and the mechanism for removing material from STO ceramic substrates are discussed in detail.
机译:钛酸锶(SRTIO3,STO)陶瓷基板是一种初级铁电材料,具有钙钛矿结构,其在微波,毫米波和光纤领域具有广泛的应用。本文通过使用新的磁热野由磁极旋转形成动态磁场的新磁流变学(MR)精加工方法,报告了STO基板上进行的实验系统。结果表明,通过使用单点动态磁场的MR整理抛光后,表面出现具有稳定性评估区的圆环形抛光带。当磁极增加和磁极放大的偏心的转数时,动态磁场更强,表面光洁度更光滑,并且移除了更多的材料。最佳加工时间,加工间隙,振荡距离,磁极的偏心,工件的转数和磁极的60分钟,0.8mm,0 mm,7mm,350 r min(-1)和90 r min(-1分别,最佳MR流体分别由W1粒度和18wt%的W1粒度和18wt%的羰基铁粉组成的6wt%。在这些最佳过程条件下,可以获得Ra的表面粗糙度和8nm和0.154μmmin(-1)的材料去除速率。最后,详细讨论了动态磁场的抛光机制和用于从STO陶瓷基板中除去材料的机构。

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