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首页> 外文期刊>SID International Symposium: Digest of Technology Papers >Enhancement in the Mobility and the Stability of Solution-Processed Zinc-Tin Oxide Thin-Film Transistors Using Alkali Metal Superoxide
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Enhancement in the Mobility and the Stability of Solution-Processed Zinc-Tin Oxide Thin-Film Transistors Using Alkali Metal Superoxide

机译:使用碱金属超氧化物的迁移率和溶液加工锌 - 氧化锌薄膜晶体管的稳定性增强

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摘要

We have studied how to improve the mobility and stability of solution processed zinc-tin oxide thin-film transistors (ZTO TFTs) simultaneously using multifunctional potassium superoxide precursor. Potassium cations in the potassium superoxide precursor acts as a shallow donor in the ZTO thin film to improve the carrier concentration (electron), which allows the potassium-doped ZTO TFT to exhibit high mobility. Then, the anion of the precursor exists as a superoxide radical, and it showed the effect of reducing the oxygen vacancy in the process of forming the oxide thin film. Consequently, potassium-doped ZTO TFT using potassium superoxide precursor exhibited improved mobility and stability, showing an increase in the mobility from 5.11 to 8.36 cm~2/Vs and a decrease in the threshold voltage shift from 4.65 to 3.36 V under a negative bias temperature illumination stress test conducted over 5,000 sec.
机译:我们研究了如何使用多功能钾超氧化物前体同时提高溶液加工锌氧化锌薄膜晶体管(ZTO TFT)的迁移率和稳定性。 钾超氧化钾前体中的钾阳离子充当ZTO薄膜中的浅供体,以改善载体浓度(电子),其允许掺杂的氢钾Zto TFT表现出高迁移率。 然后,前体的阴离子作为超氧化物自由基存在,并且它表明在形成氧化物薄膜的过程中降低氧空位的效果。 因此,使用超氧化钾前体的钾掺杂的ZtO TFT表现出改善的迁移率和稳定性,显示在负偏压下,从5.11至8.36cm〜2 / Vs的迁移率的增加和阈值电压偏移的减小 照明应力测试超过5,000秒。

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