Minimization of the Total Depth of Internal Saw-Tooth Reliefs of a Two-Layer Relief-Phase Diffraction Microstructure

摘要

Results of studying the possibility to decrease the total depth of reliefs of a two-layer microstructure having two internal saw-tooth microreliefs reducing the dependence of the diffraction efficiency of the microstructure on the radiation wavelength and angle of radiation incidence on the microstructure are presented. These results allow one to minimize the complexity of obtaining optimum microrelief depths depending on requirements applicable to the diffraction optical element in the framework of the electromagnetic-diffraction theory. Optimum depths provide in the specified spectral range and interval of angles of radiation incidence the maximum possible (for the chosen width of the narrowest zone of the saw-tooth microrelief) value of the diffraction efficiency at the point of its minimum.