Study of the optical methods of formation of multilevel profile in the thin films of a hybrid photopolymer material based on thiol-siloxane and acrylate oligomers

摘要

AbstractThis paper describes a study of the optical methods for fabrication of multilevel profile in the layers of a Hybrimer-TATS hybrid photopolymer material based on thiol-siloxane and acrylate oligomers. Grayscale photolithography and direct laser writing are used to form multilevel structures 3.5 and 6μin height, respectively. The characteristic curves and photosensitivity of the material are determined. The film preparation and treatment processes are optimized, and it is determined that addition of the stages of pre- and post-exposure significantly affects the photosensitive properties of Hybrimer-TATS. The photopolymer is promising as a structural material for the formation of microstructured optical components.]]>