Erratum to: “Influence of external conditions on physical processes and plasma parameters in a model of a high-frequency hybrid plasma system”

著录项

• 来源
  《Russian Microelectronics》 |2017年第4期|共1页
• 作者

  A. F. Aleksandrov; A. K. Petrov; K. V. Vavilin; E. A. Kral’kina; P. A. Neklyudova; A. M. Nikonov; V. B. Pavlov; A. A. Airapetov; V. V. Odinokov; G. Ya. Pavlov; V. A. Sologub;

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• 作者单位

  Moscow State University;

  Moscow State University;

  Moscow State University;

  Moscow State University;

  Moscow State University;

  Moscow State University;

  Moscow State University;

  OAO Research Institute of Precision Machine Manufacturing;

  OAO Research Institute of Precision Machine Manufacturing;

  OAO Research Institute of Precision Machine Manufacturing;

  OAO Research Institute of Precision Machine Manufacturing;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类 微电子学、集成电路（IC）;
• 关键词