Detailed optical analysis of 100 MeV Ni7+ ion irradiated WO3 thin films using Surface Plasmon Resonance

摘要

Modifications in the structural, optical properties and surface morphology of RF sputtered WO3 thin films after irradiation with 100 MeV Ni7+ ions have been reported in the present article. The WO3 thin films were deposited at different sputtering pressures (10-50 mTorr). Despite the grain growth due to irradiation, no structural phase transformation has been observed for the WO3 thin films deposited up to 30 mTorr growth pressure. However, complete amorphization post irradiation was detected for the orthorhombic WO3 thin film grown at 50 mTorr sputtering pressure. AFM images indicated that the pristine WO3 thin film consists of uniform grains having smooth surface morphology. Upon irradiation, grain size increased consistently along with increase in surface roughness (R-q) at all sputtering pressures. The root mean square roughness (R-q) estimated from AFM analysis increased from 1.76 nm in pristine film to 9.89 nm in response to irradiation at a fluence of 1 x 10(12) ions cm(-2). A systematic decrease in optical band gap has been observed with irradiation, which can be correlated with Ni7+ ion induced mid-gap and near band edge defect states. Surface Plasmon Resonance (SPR) technique has been recognized as an appropriate tool to study the optical properties of pristine and irradiated WO3 thin films. SPR reflectance curves were recorded in angular interrogation mode at 633 nm excitation wavelength for pristine and Ni7+ ions irradiated WO3 films deposited at varying deposition pressure.