Recent Advances in Plasmonic Nanolithography

摘要

The field of plasmonics has attracted great attention in the last decade because it permits avoidance of the diffraction limit and enables strong field enhancement in sub-wavelength dimensions. This review summarizes recent progress in plasmonic nanolithography, which is considered one of the most remarkable technologies for next-generation nanolithography processing. Different plasmonic nanolithography methods, such as extraordinary transmittance-based lithography, localized surface plasmon lithography, superlens-based nanolithography, and interference-based nanolithography, are discussed in this review. The development trends of plasmonic nanolithography are also introduced. This review not only provides basic knowledge to familiarize new researchers with the plasmonic nanolithography field, but also serves as a reference for experienced researchers to track current research trends.