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Ab initio molecular dynamics simulation of self-diffusion in Al-Si binary melts

机译:AL-Si二元熔体中自扩散的AB Initio分子动力学模拟

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Ab initio molecular dynamics simulations have been used to predict diffusion coefficients in Al-Si binary melts as a function of composition and temperature. The self-diffusion coefficients of Al and Si are obtained from the mean-squared displacements and velocity autocorrelation functions employing two different exchange correlation functionals. The Si-concentrations include 0, 7, 12 and 15 at% Si with temperature ranging from 900-1800 K. In these Al-Si melts, aluminum and silicon exhibit nearly identical diffusion coefficients. The first nearest neighbor-shell coordinations of Al and Si vary slightly with composition and temperature and exhibit no significant changes in the vicinity of the eutectic. The density of the binary liquids including the eutectic composition (Al-12 at% Si) showed linear dependence on temperature.
机译:AB Initio分子动力学模拟已用于预测Al-Si二元熔体中的扩散系数作为组合物和温度的函数。 Al和Si的自扩散系数是从使用两个不同的交换相关功能的平均平均位移和速度自相关函数获得。 Si-浓度包括0,7,12和15的%Si,其温度范围为900-1800k。在这些Al-Si熔融中,铝和硅表现出几乎相同的扩散系数。 Al和Si的第一个最近邻壳协调随着组成和温度而略微不同,并且在共晶附近没有显着变化。 包括共晶组合物(Al-12在%Si)的二元液体的密度显示线性依赖性对温度。

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