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首页> 外文期刊>Crystal Research and Technology: Journal of Experimental and Industrial Crystallography >AXIAL TEMPERATURE DISTRIBUTION IN SILICON-GERMANIUM GROWN BY THE RF-HEATED FLOAT ZONE TECHNIQUE
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AXIAL TEMPERATURE DISTRIBUTION IN SILICON-GERMANIUM GROWN BY THE RF-HEATED FLOAT ZONE TECHNIQUE

机译:射频加热浮区技术在硅锗生长中的轴向温度分布

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摘要

The RF-heated float zone method has been used to study the segregation behaviour of silicon-germanium solid solutions in the concentration range from 0 to 25 at% germanium. Completely dislocation free crystals up to 8 at% germanium could be obtained. Since constitutional supercooling is the main reason preventing single crystalline growth, pyrometric temperature measurements have been performed to reveal the temperature slops at the interface and to determine the critical growth rate. The temperature gradient Delta T/Delta z was found to increase with increasing germanium concentration. [References: 15]
机译:射频加热的浮区法已用于研究锗浓度为0至25 at%的硅锗固溶体的偏析行为。可以获得高达8 at%的锗的完全位错自由晶体。由于体质过冷是阻止单晶生长的主要原因,因此进行了高温测温,以揭示界面处的温度斜率并确定临界生长速率。发现温度梯度ΔT/Δz随着锗浓度的增加而增加。 [参考:15]

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