首页> 外文期刊>Crystallography reports >Growth of Bi_(12)GeO_(20) and Bi_(12)SiO _(20) crystals by the low-thermal gradient Czochralski technique
【24h】

Growth of Bi_(12)GeO_(20) and Bi_(12)SiO _(20) crystals by the low-thermal gradient Czochralski technique

机译:低热梯度直拉法生长Bi_(12)GeO_(20)和Bi_(12)SiO_(20)晶体

获取原文
获取原文并翻译 | 示例
           

摘要

Bi_(12)SiO_(20) crystals have been grown for the first time by the low-thermal gradient Czochralski technique in the <111> and <110> directions. The conditions for reproducible crystal growth with a high-quality polyhedral faceted front are found. The systematic features of shaping Bi_(12)SiO_(20) and Bi_(12)GeO_(20) crystals, grown by the low-thermal gradient Czochralski technique, are compared. The defect formation in these crystals is studied and their optical homogeneity is analyzed by interferometry.
机译:Bi_(12)SiO_(20)晶体是通过低热梯度直拉技术在<111>和<110>方向上首次生长的。找到了具有高质量多面多面正面的可再生晶体生长的条件。比较了通过低热梯度直拉法生长的Bi_(12)SiO_(20)和Bi_(12)GeO_(20)晶体的整形特征。研究了这些晶体中的缺陷形成,并通过干涉法分析了它们的光学均匀性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号