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Study of defects in Li-doped ZnO thin films

机译:锂掺杂ZnO薄膜缺陷的研究

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Li-doped ZnO films were deposited on glass substrate by sol-gel spin coating technique. In order to investigate the effect of Li doping on ZnO thin films properties, we have varied the Li doping ratio in the range of 0-10%. The structural and optical properties of samples have been investigated by X-ray diffraction and UV-Vis spectroscopy. XRD analysis reveals that doped and undoped films have an hexagonal Wurtzite structure. The optical measurements indicate that Li doping causes the red shift of the absorption edge. Films photoluminescence spectra do not contain any defects peak related to Li atoms. Being too close to the valence band, the Li defect level is buried in the band tail width states; this explains the difficulty of its detection. However, the effect of Li doping, manifests through its oxygen vacancy defects promotion to the detriment of oxygen interstitial oxygen defect.
机译:通过溶胶 - 凝胶旋涂技术沉积在玻璃基板上的锂掺杂ZnO膜。 为了探讨Li掺杂对ZnO薄膜性能的影响,我们的锂掺杂比在0-10%的范围内。 通过X射线衍射和UV-VI光谱研究样品的结构和光学性质。 XRD分析显示,掺杂和未掺杂的薄膜具有六边形纯矿石结构。 光学测量表明Li掺杂导致吸收边缘的红色移位。 薄膜光致发光光谱不含与Li原子相关的任何缺陷峰。 靠近价频带,李缺陷水平埋在带尾宽度状态; 这解释了其检测的难度。 然而,李掺杂的影响,通过其氧气空位缺陷促进促进氧气间隙氧缺陷。

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