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首页> 外文期刊>Materials and Corrosion >Effect of Ti interlayer on corrosion behavior of nanostructured Ti/TiN multilayer coating deposited on TiAl 66 V 44
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Effect of Ti interlayer on corrosion behavior of nanostructured Ti/TiN multilayer coating deposited on TiAl 66 V 44

机译:Ti interlayer对Tial沉积纳米结构Ti / TiN多层涂层腐蚀行为的影响 6 6 V. 4 4

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> To improve the corrosion properties of TiAl 6 V 4 alloy, TiN monolayer and Ti/TiN multilayer coatings are deposited by reactive magnetron sputtering. The phase, structure, and morphology properties are investigated by grazing‐incidence X‐ray diffraction, field‐emission scanning electron microscopy, and atomic force microscopy, respectively, and the corrosion behavior is evaluated by electrochemical impedance spectroscopy and potentiodynamic polarization. The TiN monolayer and Ti/TiN multilayer with thickness of 1,350 and 1,410?nm have the (111) and (002) preferred orientation and crystallite size of 42.5 and 24.3?nm, respectively. Columnar growth in TiN is hindered by the Ti interlayers and no cracking is observed between the layers indicating strong adhesion. The nanostructured Ti/TiN coating forms stable surface titanium oxide which improves the corrosion resistance by approximately 80 and four times compared with TiAl 6 V 4 alloy and TiN coating, respectively. Hindrance of the columnar structure in TiN by the Ti interlayer decreases the local corrosion rate and enhances the galvanic corrosion resistance by forming a layer on the β‐phase enriched with vanadium as well as a TiO 2 stable layer. The nanostructured Ti/TiN coating demonstrates capacitive behavior with phase angles approximately ?50° and high impedance values at low frequency to be the corrosion resistance mechanism.
机译: > 改善Tial的腐蚀性 6 V. 4 通过反应性磁控溅射沉积合金,锡单层和Ti / TiN多层涂层。通过放牧入射X射线衍射,现场 - 发射扫描电子显微镜和原子力显微镜研究研究相位,结构和形态学性质,并且通过电化学阻抗光谱和电位辐射极化评估腐蚀行为。锡单层和Ti / TiN多层具有1,350和1,410Ω·Nm的厚度为(111)和(002)优选的取向和微晶尺寸,分别为42.5和24.3μm。锡中的柱状生长由Ti夹层阻碍,并且在表明具有强粘合的层之间没有观察到破裂。纳米结构Ti / TiN涂层形成稳定的表面氧化钛,与Tial相比,将耐腐蚀性提高约80和四次 6 V. 4 合金和锡涂层。通过Ti interlayer在锡中的柱状结构的阻碍降低了局部腐蚀速率,通过在富含钒以及TiO的β相的层上形成了电抗性耐腐蚀性 2 稳定的层。纳米结构的Ti / TiN涂层表明了相位角的电容性能大约Δ50°和低频的高阻抗值,以成为耐腐蚀机制。

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