Polymer Masking Method for a High Speed Roll-to-Roll Process

摘要

A new polymer masking system with photo-degradable material applicable to high-speed roll-to-roll vacuum deposition processing was studied. Specifically, a process using intense pulsed light to quickly and cleanly remove polymer masks was developed. Poly(methyl methacrylate) (PMMA) and TiO~(2)were blended together with the positive photoresist to prepare a photo-degradable polymer masking. Infrared spectroscopy confirmed that the positive photoresist moiety, diazonaphtoquinone, was photo-decomposed by white intense pulsed light. The process time required to remove the polymer mask was short enough that this method could be used even in high-speed roll-to-roll processes. It was confirmed that the polymer mask film could be easily removed even at a high process speed by using pressurized gas and adhesive roller tape. The transparent electrode was patterned using a polymer mask and an etching paste, and full solution processed inverted type OPV devices were fabricated. The fabricated OPV by direct etching showed a 94% efficiency compared with that of the reference device.