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Mesoporous manganese oxide nanowires for high-capacity, high-rate, hybrid electrical energy storage

机译:用于高容量,高速率,混合电能存储的中孔氧化锰纳米线

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Arrays of mesoporous manganese dioxide, mp-MnO_2, nanowires were electrodeposited on glass and silicon surfaces using the lithographically patterned nanowire electrodeposition (LPNE) method. The electrodeposition procedure involved the application, in a Mn(ClO_4)_2- containing aqueous electrolyte, of a sequence of 0.60 V (vs MSE) voltage pulses delineated by 25 s rest intervals. This "multipulse" deposition program produced mp-MnO_2 nanowires with a total porosity of 43-56%. Transmission electron microscopy revealed the presence within these nanowires of a network of 3-5 nm diameter fibrils that were X-ray and electron amorphous, consistent with the measured porosity values. mp-MnO_2 nanowires were rectangular in cross-section with adjustable height, ranging from 21 to 63 nm, and adjustable width ranging from 200 to 600 nm. Arrays of 20 nm × 400 nm mp-MnO_2 nanowires were characterized by a specific capacitance, C_(sp), of 923 ± 24 F/g at 5 mV/s and 484 ± 15 F/g at 100 mV/s. These C_(sp) values reflected true hybrid electrical energy storage with significant contributions from double-layer capacitance and noninsertion pseudocapacitance (38% for 20 nm × 400 nm nanowires at 5 mV/s) coupled with a Faradaic insertion capacity (62%). These two contributions to the total C_(sp) were deconvoluted as a function of the potential scan rate.
机译:使用光刻图案化的纳米线电沉积(LPNE)方法将中孔二氧化锰,mp-MnO_2纳米线阵列电沉积在玻璃和硅表面上。电沉积过程涉及在含有Mn(ClO_4)_2的水性电解质中施加一系列0.60 V(vs MSE)电压脉冲,其间隔时间为25 s。该“多脉冲”沉积程序产生了总孔隙率为43-56%的mp-MnO_2纳米线。透射电子显微镜显示在这些纳米线中存在直径为3-5nm的原纤维的网络,所述原纤维是X射线和电子非晶态的,与测得的孔隙率值一致。 mp-MnO_2纳米线的横截面为矩形,高度可调,范围为21至63 nm,宽度可调,范围为200至600 nm。 20 nm×400 nm mp-MnO_2纳米线的阵列的特征在于,比电容C_(sp)在5 mV / s时为923±24 F / g,在100 mV / s时为484±15 F / g。这些C_(sp)值反映了真正的混合电能存储,其中双层电容和非插入伪电容(20 nm×400 nm纳米线在5 mV / s时为38%)和法拉第插入电容(62%)具有显着贡献。将这两个对总C_(sp)的贡献作为潜在扫描速率的函数进行反卷积。

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