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Narrow-Gap Quantum Wires Arising from the Edges of Monolayer MoS_2 Synthesized on Graphene

机译:从石墨烯上合成的单层MoS_2的边缘产生的窄间隙量子线

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摘要

MoS_2/graphene (MoS_2/Gr) vertical heterostructures have exhibited great application potentials in high speed electronic and optoelectronic devices, as well as efficient electrocatalysts in hydrogen evolution reaction (HER). The electronic property at the edge of monolayer MoS_2 is an essential parameter for addressing such applications. Herein, it is reported that, for monolayer MoS_2 synthesized on Gr/Au foils by chemical vapor deposition, a dramatic decrease of the bandgap from ≈2.20 to ≈0.30 eV occurs at the domain edge within a lateral distance of ≈6 nm, as evidenced by scanning tunneling microscopy/spectroscopy observations. The edges of monolayer MoS_2 on Gr/Au foils can thus be regarded as narrow-gap quantum wires considering of their reduced bandgaps. More intriguingly, it is found that this bandgap decrease at the domain edge is closely related to the rather high HER performance for MoS_2/Gr/Au foils comparing with that of MoS_2/Au foils. Briefly, this work should propel the band structure investigations for MoS_2 /Gr stacks and their applications in energy related fields.
机译:MoS_2 /石墨烯(MoS_2 / Gr)垂直异质结构在高速电子和光电设备中以及在析氢反应(HER)中的高效电催化剂方面显示出巨大的应用潜力。单层MoS_2边缘的电子特性是解决此类应用的重要参数。在这里,据报道,对于通过化学气相沉积在Gr / Au箔上合成的单层MoS_2,在约6 nm的横向距离内的畴边缘处,带隙从约2.20 eV急剧减小到约0.30 eV。通过扫描隧道显微镜/光谱学观察。考虑到它们减小的带隙,因此可以将Gr / Au箔上单层MoS_2的边缘视为窄间隙量子线。更有趣的是,发现与MoS_2 / Au箔相比,该带隙在畴边缘处的减小与MoS_2 / Gr / Au箔的较高HER性能密切相关。简而言之,这项工作将推动MoS_2 / Gr堆的能带结构研究及其在能源相关领域的应用。

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