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首页> 外文期刊>Electrical engineering in Japan >Heterogeneous bonding between cyclo‐olefin polymer (COP) and glass‐like substrate by newly developed water vapor‐assisted plasma, Aqua Plasma Cleaner
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Heterogeneous bonding between cyclo‐olefin polymer (COP) and glass‐like substrate by newly developed water vapor‐assisted plasma, Aqua Plasma Cleaner

机译：通过新开发的水蒸气辅助等离子体，水上血管辅助等离子体的环烯烃聚合物（COP）和玻璃状基材之间的异质键合

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Abstract >To develop high‐performance and low‐cost microfluidic devices, heterogeneous bonding with cyclo‐olefin polymer (COP) and glass substrate was investigated by low‐pressure plasma using water vapor. COP and glass‐like substrate were bonded at room temperature under its own weight, and the bonding strength reached the breaking point of base material strength. Water contact angle of the COP and glass surface after water vapor plasma was less than 1° (superhydrophilic) and showed stable hydrophilicity even after 30 days. Water vapor plasma and COP surface were analyzed by optical emission spectroscopy (OES) and x‐ray photoelectron spectroscopy (XPS) to study the reaction of room temperature bonding. </abstract> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> <div class="translation abstracttxt"> <span class="zhankaihshouqi fivelineshidden" id="abstract"> <span>机译：</span><Abstract XMLNS =“http://www.wiley.com/namespaces/wiley”type =“main”xml：lang =“en”> <标题类型=“main”>抽象</ title> 为了开发高性能和低成本的微流体装置，使用水蒸气通过低压等离子体研究与环烯烃聚合物（COP）和玻璃基板的异质键合。 COP和玻璃状基质在其自身重量下在室温下键合，键合强度达到基材强度的断裂点。 水蒸气等离子体在水蒸气血浆后的水接触角度小于1°（超硫酸），甚至在30天后表现出稳定的亲水性。 通过光发射光谱（OES）和X射线光电子能谱（XPS）分析水蒸气等离子体和COP表面，以研究室温键合的反应。</ p> </摘要> </span> <span class="z_kbtn z_kbtnclass hoverxs" style="display: none;">展开▼</span> </div> </div> <div class="record"> <h2 class="all_title" id="enpatent33" >著录项</h2> <ul> <li> <span class="lefttit">来源</span> <div style="width: 86%;vertical-align: text-top;display: inline-block;"> <a href='/journal-foreign-22399/'>《Electrical engineering in Japan》</a> <b style="margin: 0 2px;">|</b><span>2018年第4期</span><b style="margin: 0 2px;">|</b><span>共9页</span> </div> </li> <li> <div class="author"> <span class="lefttit">作者</span> <p id="fAuthorthree" class="threelineshidden zhankaihshouqi"> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Terai Hirokazu&option=202" target="_blank" rel="nofollow">Terai Hirokazu;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Funahashi Risa&option=202" target="_blank" rel="nofollow">Funahashi Risa;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Hashimoto Taichi&option=202" target="_blank" rel="nofollow">Hashimoto Taichi;</a> <a href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=Kakuta Masaya&option=202" target="_blank" rel="nofollow">Kakuta Masaya;</a> </p> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zkzz" style="display: none;">展开▼</span> </div> </li> <li> <div style="display: flex;"> <span class="lefttit">作者单位</span> <div style="position: relative;margin-left: 3px;max-width: 639px;"> <div class="threelineshidden zhankaihshouqi" id="fOrgthree"> <p>Samco Inc.Takeda Fushimi‐ku Kyoto Japan;</p> <p>Samco Inc.Takeda Fushimi‐ku Kyoto Japan;</p> <p>Samco Inc.Takeda Fushimi‐ku Kyoto Japan;</p> <p>SYSMEX CORPORATIONNishi‐ku Kobe Japan;</p> </div> <span class="z_kbtnclass z_kbtnclassall hoverxs" id="zhdw" style="display: none;">展开▼</span> </div> </div> </li> <li > <span class="lefttit">收录信息</span> <span style="width: 86%;vertical-align: text-top;display: inline-block;"></span> </li> <li> <span class="lefttit">原文格式</span> <span>PDF</span> </li> <li> <span class="lefttit">正文语种</span> <span>eng</span> </li> <li> <span class="lefttit">中图分类</span> <span><a href="https://www.zhangqiaokeyan.com/clc/1782.html" title="输配电工程、电力网及电力系统">输配电工程、电力网及电力系统;</a></span> </li> <li class="antistop"> <span class="lefttit">关键词</span> <p style="width: 86%;vertical-align: text-top;"> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=COP&option=203" rel="nofollow">COP;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=glass&option=203" rel="nofollow">glass;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=microfluidics&option=203" rel="nofollow">microfluidics;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=room temperature bonding&option=203" rel="nofollow">room temperature bonding;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=superhydrophilic&option=203" rel="nofollow">superhydrophilic;</a> <a style="color: #3E7FEB;" href="/search.html?doctypes=4_5_6_1-0_4-0_1_2_3_7_9&sertext=water vapor plasma&option=203" rel="nofollow">water vapor plasma;</a> </p> <div class="translation"> 机译：COP;玻璃;微流体;室温粘合;超硫酸;水蒸气等离子体; 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class="enjiyixqcontent" href="/patent-detail/06130421759192.html">Method for performing physical vapor deposition (PVD) and plasma-assisted chemical vapor deposition (PACVD) treatment on substrate in plasma chamber of sputtering apparatus, involves obtaining desired layer thickness on substrate</a> <b>[P]</b> . <span> 外国专利： <!-- 德国专利： --> DE102010061487A1 </span> <span> . 2012-06-28</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：在溅射设备的等离子体室中在基板上进行物理气相沉积（PVD）和等离子体辅助化学气相沉积（PACVD）处理的方法，涉及在基板上获得所需的层厚 </span> </p> </li> <li> <div> <b>4. </b><a class="enjiyixqcontent" href="/patent-detail/06130420183044.html">method of manufacturing a substrate for bioassay by plasma assisted polymerization in vapor phase, the substrate funzionalizzato and bioassay device so obtained</a> <b>[P]</b> . <span> 外国专利： <!-- --> ITTO20110559A1 </span> <span> . 2012-12-25</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：气相等离子体辅助聚合制备生物测定用底物的方法，该底物功能测定法和由此获得的生物测定装置 </span> </p> </li> <li> <div> <b>5. </b><a class="enjiyixqcontent" href="/patent-detail/06130443523424.html">Production of a coating on a metallic substrate involves treatment of the surface of the substrate with a plasma of an inert gas containing oxygen, and then applying a coating by plasma-assisted chemical vapor deposition</a> <b>[P]</b> . <span> 外国专利： <!-- 法国专利： --> FR2837839A1 </span> <span> . 2003-10-03</span> </div> <p class="zwjiyix translation" style="max-width: initial;height: auto;word-break: break-all;white-space: initial;text-overflow: initial;overflow: initial;"> <span>机译：在金属基底上产生涂层包括用含氧的惰性气体的等离子体处理基底的表面，然后通过等离子体辅助化学气相沉积施加涂层。 </span> </p> </li> </ul> </div> </div> </div> <div class="theme cardcommon" style="overflow: auto;display:none"> <h3 class="all_title" 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