机译:胍离子对基于H2O2浆料钌CMP的影响
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
Hebei Univ Technol Sch Elect Informat Engn Tianjin Key Lab Elect Mat &
Devices Tianjin 300130 Peoples R China;
机译:胍离子对基于H2O2浆料钌CMP的影响
机译:过碳酸盐浆化学控制钌CMP过程中电化腐蚀的研究
机译:离子强度对H_2O_2基浆料中钌CMP的影响
机译:用溴酸钾作为氧化钛基于钛基CMP浆料的钌的电化学特征
机译:CMP过程中的磨料颗粒轨迹和材料去除不均匀性以及CMP浆料的过滤特性-模拟和实验研究。
机译:使用光密度法和折射率测量表征CMP浆料
机译:电化学 - 机械平面化(eCmp),使用非常规浆料的sTI Cmp