Physical properties of nitrogen doped titanium dioxide thin films prepared by dc magnetron sputtering

摘要

In this study, nitrogen doped titanium dioxide (NTiO_2) thin films were deposited by dc reactive magnetron sputtering technique on glass substrates at different nitrogen partial pressures and studied the chemical composition, crystalline structure, surface morphology and optical properties. The composition of Ti and nitrogen increased with increasing the nitrogen partial pressures.The films exhibited anatase phase and crystallinity of films increases with increasing the nitrogen partial pressuresupto6x10~(-3) mbar. The films deposited at nitrogen partial pressure of 6x10~(-3) mbar two broad peaks are appeared at 395 and 644 cm~(-1)in Raman spectra and are from TiO_2anatase phase.The optical band gap of the films was calculated and a narrowing of the band gap from 3.11 eV to 2.98 eV was observed by increasing the nitrogen partial pressure.