首页> 外文期刊>Instruments and Experimental Techniques >The High-Resolution Bitter Decoration Technique for the Magnetic Flux Structure Imaging at Low Temperatures
【24h】

The High-Resolution Bitter Decoration Technique for the Magnetic Flux Structure Imaging at Low Temperatures

机译:低温下磁通结构成像的高分辨率苦装饰技术

获取原文
获取原文并翻译 | 示例
           

摘要

The high-resolution Bitter technique for visualization (decoration) of the magnetic-flux structure in superconductors and magnets at low temperatures is presented. This method is based on the preparation of magnetic nanoparticles directly during a low-temperature experiment (in situ) by evaporating a magnetic material in the atmosphere of a buffer gas (helium) above the sample surface. An apparatus was constructed and a technique was proposed to stabilize the temperature of a sample during decoration with an accuracy of +/- 1 K within a wide temperature range. As an example, the results of observation of the magnetic-flux structure in single crystals of BSCCO(2212) high-temperature superconductor and EuFe2(As0.79P0.21)(2) ferromagnetic superconductor at T <= 18 K are presented.
机译:提出了超导体中磁通结构的高分辨率苦技术(装饰),在低温下的磁体中的磁通量结构。 该方法通过在样品表面上方缓冲气体(氦气)的气氛中蒸发磁性材料在低温实验(原位)期间直接在磁性纳米颗粒的制备。 构建了一种装置,提出了一种技术,以在宽温度范围内的精度+/-1k的装饰期间稳定样品的温度。 作为一个示例,提出了在T <= 18K的BSCCCO(2212)高温超导体和EUFE2(AS0.79P0.21)(2)铁磁超导体的单晶体中观察磁通结构的结果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号