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Trace carbon monoxide and hydrogen conversion prior to cryogenic distillation of air

机译:空气低温蒸馏之前的痕量一氧化碳和氢气转化

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摘要

Liquid Nitrogen is required in the semiconductor industry.This is generally produced by cryogenic distillation of air.However,trace levels of Carbon Monoxide and Hydrogen need to be removed from Nitrogen prior to its use in the semiconductor industry.This may be accomplished by catalytic conversion of trace Carbon Monoxide and Hydrogen to Carbon dioxide and Water,respectively.These impurities (Carbon dioxide and Water)are then removed by adsorption from air.The latest technology is to incorporate the catalytic conversion into adsorption based thermal swing pre-purification units,which are already used to remove Water and Carbon dioxide from air prior to its cryogenic distillation.Our experiments show that even though Hydrogen is converted to Water by a catalytic reaction,presence of Carbon dioxide in this stream significantly lowers the performance of the catalyst by as much as five-fold.Also,Hydrogen removal by the novel metal Pd catalyst does not follow a typical catalyst behavior but an adsorption breakthrough type behavior,i.e.for a constant inlet concentration the outlet concentration of Hydrogen breaks through at some time and then increases with time.On the other hand,Carbon monoxide conversion on a Hopcalite type catalyst follows typical catalyst behavior,i.e.for a constant inlet concentration the outlet concentration of Carbon monoxide is constant and does not change with time.Experimental data demonstrating these effects followed by a theoretical explanation are presented.
机译:半导体工业中需要液态氮,这通常是通过空气的低温蒸馏产生的,但是在半导体工业中使用氮之前,必须先除去痕量的一氧化碳和氢,这可以通过催化转化来实现将痕量一氧化碳和氢气分别转化为二氧化碳和水。然后通过从空气中吸附去除这些杂质(二氧化碳和水)。最新技术是将催化转化结合到基于吸附的热变式预纯化装置中,我们的实验表明,即使氢气通过催化反应转化为水,该物流中的二氧化碳也会大大降低催化剂的性能另外,新型金属Pd催化剂去除氢的行为不符合典型的催化剂行为。为吸附突破型行为,即对于恒定的入口浓度,氢气的出口浓度有时会突破,然后随时间增加。另一方面,Hopcalite型催化剂上的一氧化碳转化遵循典型的催化剂行为,即恒定的进口浓度一氧化碳的出口浓度是恒定的,并且不会随时间变化。提供了证明这些作用的实验数据,然后提供了理论解释。

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