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首页> 外文期刊>Infrared physics and technology >Improved performance of In(0.83)Ga(0)A(7)As/InP photodetectors through modifying the position of In0.66Ga0.34As/InAs superlattice electron barrier
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Improved performance of In(0.83)Ga(0)A(7)As/InP photodetectors through modifying the position of In0.66Ga0.34As/InAs superlattice electron barrier

机译:通过修改IN0.66GA0.34AS / INAS超晶级电子屏障的位置,改善(0.83)GA(0)A(0)A(7)AS / INP光电探测器的性能

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摘要

The performance of wavelength extended In0.83Ga0.17As/InP photodetectors has been improved notably through modifying the position of electron barriers in absorption layer. In order to fully utilize the diffusion component of the photocurrent, the In0.66Ga0.34As/InAs superlattice electron barrier is moved to the edge of the depletion region. Enhanced peak photo responsivity up to 0.84 A/W is realized, which raises 24% compared to that of a reference detector with the superlattice barrier in the middle of the absorber. The dark current slightly increases by 25% at room temperature while decreases by more than an order of magnitude at 150 K, resulting in about 10% or more than twofold improvements for the detectivity, respectively. The results suggest that optimized barrier position is a necessity for barrier-type photodetectors to achieve better performances. (C) 2017 Elsevier B.V. All rights reserved.
机译:波长延伸的IN0.83GA0.17AS / INP光电探测器的性能显着通过修改吸收层中的电子屏障的位置来提高。 为了充分利用光电流的扩散分量,将IN0.66Ga0.34as / InAS超晶格电子屏障移动到耗尽区的边缘。 增强的峰值照片响应于高达0.84A / W,其与吸收器中间的超晶格屏障的参考检测器相比升高了24%。 室温下的暗电流略微增加25%,同时分别在150 k下减少超过一个大幅度,导致探测率为约10%或超过双重改进。 结果表明,优化的屏障位置是障碍型光电探测器以实现更好的性能的必要性。 (c)2017 Elsevier B.v.保留所有权利。

著录项

  • 来源
    《Infrared physics and technology》 |2018年第2018期|共5页
  • 作者单位

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

    Chinese Acad Sci Shanghai Inst Microsyst &

    Informat Technol State Key Lab Funct Mat Informat Shanghai 200050 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 红外线;红外技术及仪器;
  • 关键词

    Photodetector; Electron barrier; Superlattice; InGaAs; Metamorphic;

    机译:光电探测器;电子屏障;超晶格;Ingaas;变质;

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