The current trend of miniaturization and micrometeranometer scale printing of memory chips and integrated circuits results in higher cost of products such as memory chips. Lithography is an advanced technique for printing on metal substrates at submicrometer scale. However, current lithography techniques are expensive, and have a slow deposition rate. In addition, they can be used to print only 300 mm wafers, which is not sufficient to fulfill the current demand for 450 mm wafers from industries. So, it is necessary to develop a lithographic technique/method capable for patterning large objects and displays.
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