Photonic Materials: Low‐Temperature Mullite Formation in Ternary Oxide Coatings Deposited by ALD for High‐Temperature Applications (Adv. Mater. Interfaces 23/2017)

著录项

• 来源
  《Advanced materials interfaces》 |2017年第23期|共1页
• 作者

  Furlan Kaline P.; Krekeler Tobias; Ritter Martin; Blick Robert; Schneider Gerold A.; Nielsch Kornelius; Zierold Robert; Jan?en Rolf;

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• 作者单位

  Institute of Advanced CeramicsHamburg University of Technology (TUHH)Denickestra?e 15 21073 Hamburg Germany;

  Electron Microscopy Unit (BeEM)Hamburg University of Technology (TUHH)Ei?endorfer Stra?e 42 21073 Hamburg Germany;

  Electron Microscopy Unit (BeEM)Hamburg University of Technology (TUHH)Ei?endorfer Stra?e 42 21073 Hamburg Germany;

  Institute of Nanostructure and Solid State Physics and Center for Hybrid NanostructuresUniversit?t HamburgJungiusstra?e 11B 20355 Hamburg Germany;

  Institute of Advanced CeramicsHamburg University of Technology (TUHH)Denickestra?e 15 21073 Hamburg Germany;

  Institute of Nanostructure and Solid State Physics and Center for Hybrid NanostructuresUniversit?t HamburgJungiusstra?e 11B 20355 Hamburg Germany;

  Institute of Nanostructure and Solid State Physics and Center for Hybrid NanostructuresUniversit?t HamburgJungiusstra?e 11B 20355 Hamburg Germany;

  Institute of Advanced CeramicsHamburg University of Technology (TUHH)Denickestra?e 15 21073 Hamburg Germany;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类 特种结构材料;
• 关键词

  atomic layer deposition; high‐temperature applications; mullite; photonic crystals; thermal barrier coatings;

  机译：原子层沉积;高温应用;莫来石;光子晶体;热障涂层;