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机译:降低缺陷状态密度 2 sub> 2 O. 3 sub> 3 / GA. x sub> i> x sub> x 在 1? sub> 1? x sub> i> x sub> x 作为与INO的设备接口 x sub> i> x sub> x 结构
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Department of Physics and AstronomyUniversity of TurkuFI‐20014 Turku Finland;
Renewable EnergyHelmholtz‐Zentrum Berlin für Materialien und Energie GmbHHahn‐Meitner‐Platz 1 D‐14109 Berlin Germany;
Department of ChemistryUniversity of TurkuFI‐20014 Turku Finland;
Optoelectronics Research CentreTampere University of TechnologyFI‐33101 Tampere Finland;
Optoelectronics Research CentreTampere University of TechnologyFI‐33101 Tampere Finland;
Optoelectronics Research CentreTampere University of TechnologyFI‐33101 Tampere Finland;
Optoelectronics Research CentreTampere University of TechnologyFI‐33101 Tampere Finland;
defects; GaAs; HAXPES; interface; oxide;
机译:降低缺陷状态密度 2 sub> 2 O. 3 sub> 3 / GA. x sub> i> x sub> x 在 1? sub> 1? x sub> i> x sub> x 作为与INO的设备接口 x sub> i> x sub> x 结构
机译:界面电极形态对有机光伏器件中载流子浓度和捕集缺陷密度的影响
机译:在室温下以不同的射频功率密度沉积的器件质量InO_x:Sn和InO_x薄膜
机译:由MBE生长的(4 1 1)A超平坦界面的拟态Ino.74Gao.26As / Ino.52Alo.48As量子阱HEMT结构中的高电子迁移率的优化沟道厚度
机译:氮化铝镓/氮化镓器件结构的研究和表征,以及材料缺陷和工艺对器件性能的影响。
机译:纳米结构氧化物界面上的可调整的一维电子气载流子密度
机译:固有薄膜器件异质结的电子特性和纳米晶锗锗器件的缺陷密度分布研究
机译:用于aBCs器件的低缺陷密度基板和高质量外延衬底接口以及声子介导的THz激光器的进展