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EKV3 compact modeling of MOS transistors from a 0.18 mu m CMOS technology for mixed analog-digital circuit design at low temperature

机译:采用0.18微米CMOS技术的MOS晶体管的EKV3紧凑模型,用于低温混合数字电路设计

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摘要

The standard version of the EKV3 compact model is evaluated for simulation of mixed analog-digital circuits working at low temperature (77-200 K). This evaluation is performed on a dual gate oxide CMOS technology with 0.18 mu m/1.8 V and 0.35 mu m/3.3 V MOSFET transistors. A detailed temperature analysis of some physical effects is performed. Specific effects, such as anomalous narrow channel effect, freeze-out in Lightly Doped drain (LDD) regions or quantization of the inversion charge, are observed at low or intermediate temperature. Some improvements of this compact model will allow a more accurate description of MOS transistors at low temperature.
机译:对EKV3紧凑型模型的标准版本进行了评估,以仿真在低温(77-200 K)下工作的混合模拟数字电路。该评估是在具有0.18μm/ 1.8 V和0.35μm/ 3.3 V MOSFET晶体管的双栅氧化物CMOS技术上进行的。对一些物理效应进行了详细的温度分析。在低温或中等温度下,会观察到特定的影响,例如反常的窄沟道效应,轻掺杂漏极(LDD)区域的冻结或反转电荷的量化。此紧凑模型的一些改进将允许更准确地描述低温下的MOS晶体管。

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