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Comparison of Nd Doping Effect on SrTiO_3 Thin Films Grown by PLD and CSD on LaA103 Substrate

机译:LAA103基板上PLD和CSD生长的SRTIO_3薄膜的ND掺杂效应的比较

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SrTiO_3;Nd (0, 1 and 4%) thin films were prepared by pulsed laser deposition and chemical solution deposition techniques on (100) LaA103 single crystal substrates. The influence of neodymium amount as well as the influence of the deposition method on the structural and microstructura? properties of the films was evaluated. All of the films are (hOO) oriented and present high quality epitaxial growth. A higher short-range disorder occurs for the 4% Nd-doped films obtained by chemical solution deposition, evidenced by the presence of the TO_2, LO_2 and LO_4 first-order Raman modes and by an increase in the intensity of the photo luminescent spectrum. A greater effect of doping is also observed on the microstructure of this film.
机译:SRTiO_3; Nd(0,1和4%)通过脉冲激光沉积和化学溶液沉积技术(100)LaA103单晶基板上制备薄膜。 钕数量的影响以及沉积方法对结构和微观结构的影响吗? 评估薄膜的性质。 所有电影都是(HOO)定向并呈现出高质量的外延生长。 通过化学溶液沉积获得的4%Nd掺杂膜发生较高的短距离障碍,通过TO_2,LO_2和LO_4一阶拉曼模式的存在和通过光发光光谱的强度的增加来证明。 在该薄膜的微观结构上也观察到掺杂的更大效果。

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