A novel approach for UV-patterning with binary polymer brushes

摘要

Graphical abstractSchematic procedures to construct a binary polymer brush.Display OmittedHighlights?A mixed SAM of a Br-carrying initiator for ATRP and an agent for RAFT polymerization.?Scission of BrC bond in the SAM by the UV-irradiation through a photomask.?ATRP of nonpolar monomer and subsequent RAFT polymerization of zwitterionic monomer.?Pattering with both hydrophobic and zwitterionic polymer brush domains.AbstractA mixed self-assembled monolayer (SAM) of an initiator (3-(2-bromo-2-isobutyryloxy)propyl triethoxysilane) for atom transfe