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Tuning the electronic structure of 2D materials by strain and external electric field: Case of GeI2 monolayer

机译:通过应变和外部电场调整2D材料的电子结构:GEI2单层的情况

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摘要

Strain and external electric field effect on electronic structure of GeI2 monolayer has been investigated using first principles calculations. The obtained results indicate that GeI2 monolayer is an indirect semiconductor with band gap value of 2.188 eV. With biaxial strain, the band gap of considered material increases slightly with compression up to - 6% and then it decreases and shows abrupt drop for strain - 9% to - 12%, whereas it just shows decreasing trend with tensile strain. In case of uniaxial strain, the band gap value increases nearly linearly under the effect of considered strain range. The weak external electric field has no significant effect on the band gap of GeI2 monolayer, while with E = +/- 0.6 (eV/angstrom/e), the band gap decreases considerably as I-6s state in conduction band moves to the lower energy levels.
机译:使用第一个原理计算研究了对Gei2单层电子结构的应变和外部电场影响。 所得结果表明,GE2单层是具有2.188eV的带隙值的间接半导体。 通过双轴应变,所认为材料的带隙略微增加,压缩高达-6%,然后减少并显示出菌株的突然下降 - 9%至-12%,而它只显示了拉伸菌株的降低趋势。 在单轴应变的情况下,带隙值在考虑应变范围的效果下几乎线性增加。 弱外电场对Gei2单层的带隙没有显着影响,而在e = +/- 0.6(EV / Angstrom / E)中,随着导通带中的I-6S状态移动到较低的频带差距显着降低 能量水平。

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