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Density Functional Theory Calculations of Geometrical and Electronic Properties of Neutral and Charged Silicon Oxide Clusters

机译:中性和带电氧化硅簇几何和电子性能的密度函数理论计算

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摘要

We investigate neutral and charged silicon oxide clusters (SinOn, n = 1-7) using density functional theory (DFT) calculations. For searching a local minimum structure of neutral, cationic, and anionic silicon oxide clusters, ab initio Monte Carlo (MC) simulations are used. Local minimum structures founded from simulations are again calculated using DFT calculations to find a global minimum structure. Relative energies based on total energy differences between the most stable structure and the possible isomers obtained from the calculation are reported. For studying structural properties of silicon oxide clusters, the PBE functional is used with DGDZVP and CEP-121G* basis sets. These basis sets are compared with each other and with the DGDZVP and 6-311 + G* basis sets, which are also compared with each other in terms of their electronic properties. Thus, the PBE/DGDZVP model is the best choice for large silicon oxide clusters calculations. Examinations are performed on the Si—O distances, Si-O-Si average bond angles, atomization energies per atom, second difference in energies, HOMO-LUMO gaps, adiabatic ionization potentials, and adiabatic electron affinities. All calculations use Gaussian09 program.
机译:我们使用密度泛函理论(DFT)计算研究中性和带电氧化硅簇(Sinon,N = 1-7)。为了搜索中性,阳离子和阴离子氧化硅簇的局部最小结构,使用AB Initio Monte Carlo(MC)模拟。使用DFT计算再次计算仿真的局部最小结构,以查找全局最小结构。报道了基于最稳定的结构与从计算中获得的可能异构体之间的总能量差异的相对能量。用于研究氧化硅簇的结构性质,PBE功能与DGDZVP和CEP-121G *为基集。这些基集合彼此比较,并且DGDZVP和6-311 + G *基集合,其在其电子特性方面也相互比较。因此,PBE / DGDZVP模型是大型氧化硅簇计算的最佳选择。在Si-O距离,Si-O-Si平均键角,每个原子的雾化能量,能量的雾化能量,均匀隙间隙,绝热电离电位和绝热电子亲和力的雾化能量进行检查。所有计算使用Gaussian09程序。

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