首页> 外文期刊>Bulletin of Materials Science >Effect of annealing treatment on optical properties and microstructural variation of WO3/Ag/WO3 multilayer nano-films
【24h】

Effect of annealing treatment on optical properties and microstructural variation of WO3/Ag/WO3 multilayer nano-films

机译:退火处理对WO3 / Ag / WO3多层纳米膜光学性能和微观结构变化的影响

获取原文
获取原文并翻译 | 示例
           

摘要

Structural and optical properties of WO3/Ag/WO3 nano-multilayer compositeswere investigated for heat mirror applications. WO3/Ag/WO3 thin films were fabricated through a physical vapour deposition method by using electron-beam evaporation at the vacuum chamber at 10(-5) Torr. WO3 nano-layer was fabricated at 40 nm. Annealing treatment was carried out at 100, 200, 300 and 400 degrees C for 1 h after the deposition of first layer of WO3 on the glass. On WO3 film, Ag nano-layers with 10, 12 or 14 nm thickness were deposited. Individual layers morphology was investigated using atomic force microscopy (AFM) and deduced that a smoother layer can be achieved after the annealing at 300 degrees C. Ellipsometry analysis was executed to determine both layers, Ag film thickness and inter-diffusion between the WO3-Ag-WO3 layers. It was inferred that there was almost no interfering among the WO3-WO3 layers in the samples with 12 and 14 nm Ag thickness; while silver was deposited on the annealed WO3 layer at 300 degrees C. UV-visible spectrophotometer showed that the annealing treatment of the first WO3 layer enhanced the transparency of films in the visible region. The innovations of the present study have been based on the annealing of the films and finding an optimum thickness for the Ag film at 12-14 nm. Heat mirrors efficiency was assessed according to the principle of their optical behaviour and optimum performance obtained for 14 nm of Ag film, deposited on annealed tungsten oxide at 300 degrees C.
机译:WO3 / AG / WO3纳米多层复合材料的结构和光学性能研究了热镜应用。通过在10(-5)托的真空室中的电子束蒸发通过物理气相沉积方法制造WO3 / AG / WO3薄膜。 WO3纳米层以40nm制造。在玻璃上沉积第一层WO3之后,在100,200,300和400℃下进行退火处理1小时。在WO3膜上,沉积厚度为10,12或14nm的Ag纳米层。使用原子力显微镜(AFM)研究各个层形态,并推导出在300摄氏度的退火后可以实现更平滑的层。执行椭圆形分析以确定WO3-AG之间的层,Ag膜厚度和扩散之间的两层-wo3层。推断出在具有12和14nm Ag厚度的样品中的WO3-WO3层中几乎没有干扰;虽然银在300摄氏度下沉积在退火的WO3层上。UV可见分光光度计显示第一WO3层的退火处理增强了可见区域中薄膜的透明度。本研究的创新是基于薄膜的退火,并在12-14nm处为Ag膜寻找最佳厚度。根据其光学行为的原理评估热镜效率,并在300摄氏度下沉积在退火的钨氧化物上获得的14nm的最佳性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号