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High-k double gate junctionless tunnel FET with a tunable bandgap

机译:带有可调带隙的高k双门连接隧道FET

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摘要

In the present work, the performance of a heterostructure double gate junctionless tunnel FET (HJL-DGTFET) having a tunable source bandgap has been analyzed using a 2D simulation technique. The tunable source HJL-DGTFET shows a high ON-current (approximate to 6.5 x 10(-5) A mu m(-1)) and a very low OFF-current (approximate to 4.8 x 10(-17) A mu m(-1)). The device shows a point subthreshold slope approximate to 36.2 to 26.8 mV per decade and the average subthreshold slope approximate to 86.1 to 84.2 mV per decade for 0.0-40.0% Ge-mole fractions at room temperature with an I-ON/I-OFF ratio of 10(12). The excellent switching characteristics and steeper subthreshold slope at room temperature indicate that this is a promising candidate for the replacement of bulk MOSFETs. In this article, the optimization of device parameters such as the oxide thickness (t(ox)), gate dielectric material and spacer has also been discussed in detail.
机译:在本作工作中,通过使用2D仿真技术分析了具有可调谐源带隙的异质结构双栅极连接隧道FET(HJL-DGTFET)的性能。 可调源HJL-DGTFET显示高电流(近似为6.5 x 10(-5)MU M(-1))和非常低的关闭电流(近似为4.8 x 10(-17)a mu m (-1))。 该器件显示点亚阈值斜坡近似为每十年的36.2至26.8 mV,平均亚阈值斜坡近似为每十年的86.1至84.2mV,在室温下以I-ON / I-OFF比率在室温下为0.0-40.0%的Ge-mole馏分。 10(12)。 室温下的优异的开关特性和陡峭的亚阈值斜率表明这是更换散装MOSFET的有希望的候选者。 在本文中,还详细讨论了诸如氧化物厚度(T(OX)),栅极电介质材料和间隔件的装置参数的优化。

著录项

  • 来源
    《RSC Advances》 |2015年第67期|共7页
  • 作者单位

    Indian Inst Technol Dept Elect Engn Kanpur 208016 Uttar Pradesh India;

    Univ Texas Austin Microelect Res Ctr Austin TX 78758 USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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