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Heterogeneous sensors of pressure sensor and ultraviolet photodetector fabricated by vertical 3D stacking as a multi-functional device

机译:通过垂直3D堆叠制造的压力传感器和紫外光探测器作为多功能装置制造的紫外光探测器的异质传感器

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摘要

Microelectromechanical system (MEMS) piezoresistive pressure sensor and ZnO nanowires (NWs) ultraviolet (UV) photodetector were 3D integrated into a single chip with a vertically stacked structure. The MEMS pressure sensor with a UV transparent SiO2 diaphragm was stacked on the top of UV photodetector. The fabricated pressure sensor presents good linearity and stability with increasing applied pressure from 0-500 mbar. The measured interval of 0.2 mbar also shows its high sensitivity with a small change in pressure and altitude. For the ZnO NWs UV photodetector, the cutoff wavelength was around 360 nm, and the measured responsivity was 6.2 x 10(-1) A W-1 with 5 V applied bias. To discuss the influence of the applied pressure and UV on this 3D stacked device, the pressure sensor was also measured with and without UV illumination, and the UV photodetector was measured at various applied pressures. The results show that UV variation can be ignored for pressure sensor measurement. However, the photoresponses of ZnO NWs decreased, whereas the applied pressure was increased.
机译:微机电系统(MEMS)压阻式压力传感器和ZnO纳米线(NWS)紫外线(UV)光电探测器以垂直堆叠结构集成到单个芯片中的3D。具有UV透明SiO2隔膜的MEMS压力传感器堆叠在UV光电探测器的顶部。制造的压力传感器具有良好的线性度和稳定性,随着0-500毫巴的施加压力增加。 0.2毫巴的测量间隔还显示其具有较小的压力和高度变化的高灵敏度。对于ZnO NWS UV光电探测器,截止波长约为360nm,测量的响应度为6.2×10( - 1)W-1,具有5V施加的偏压。为了讨论施加的压力和UV在该3D堆叠装置上的影响,还使用紫外线照明测量压力传感器,并且在各种施加的压力下测量UV光电探测器。结果表明,对于压力传感器测量,可以忽略UV变化。然而,ZnO NWS的光响应减少,而施加的压力增加。

著录项

  • 来源
    《RSC Advances》 |2016年第100期|共7页
  • 作者单位

    Natl Appl Res Labs Natl Nano Device Labs Tainan 741 Taiwan;

    Natl Kaohsiung Univ Appl Sci Dept Mech Engn Kaohsiung 807 Taiwan;

    Natl Cheng Kung Univ Dept Elect Engn Inst Microelect Tainan 701 Taiwan;

    Natl Kaohsiung Univ Appl Sci Dept Mech Engn Kaohsiung 807 Taiwan;

    Natl Kaohsiung Univ Appl Sci Dept Mech Engn Kaohsiung 807 Taiwan;

    Natl Appl Res Labs Natl Nano Device Labs Tainan 741 Taiwan;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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