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Accuracy of dielectric-dependent hybrid functionals in the prediction of optoelectronic properties of metal oxide semiconductors: a comprehensive comparison with many-body GW and experiments

机译:金属氧化物半导体光电性能预测介电学杂交功能的精度:与许多身体GW和实验的全面比较

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摘要

Understanding the electronic structure of metal oxide semiconductors is crucial to their numerous technological applications, such as photoelectrochemical water splitting and solar cells. The needed experimental and theoretical knowledge goes beyond that of pristine bulk crystals, and must include the effects of surfaces and interfaces, as well as those due to the presence of intrinsic defects (e.g. oxygen vacancies), or dopants for band engineering. In this review, we present an account of the recent efforts in predicting and understanding the optoelectronic properties of oxides using ab initio theoretical methods. In particular, we discuss the performance of recently developed dielectric-dependent hybrid functionals, providing a comparison against the results of many-body GW calculations, including G(0)W(0) as well as more refined approaches, such as quasiparticle self-consistent GW. We summarize results in the recent literature for the band gap, the band level alignment at surfaces, and optical transition energies in defective oxides, including wide gap oxide semiconductors and transition metal oxides. Correlated transition metal oxides are also discussed. For each method, we describe successes and drawbacks, emphasizing the challenges faced by the development of improved theoretical approaches. The theoretical section is preceded by a critical overview of the main experimental techniques needed to characterize the optoelectronic properties of semiconductors, including absorption and reflection spectroscopy, photoemission, and scanning tunneling spectroscopy (STS).
机译:了解金属氧化物半导体的电子结构对于它们的许多技术应用至关重要,例如光电化学水分解和太阳能电池。所需的实验和理论知识超出了原始散装晶体的实验和理论知识,并且必须包括表面和界面的影响,以及由于存在内在缺陷(例如氧空位)或带工程的掺杂剂的情况而导致的效果。在本文中,我们介绍了使用AB Initio理论方法预测和理解氧化物光电性质的最新努力的说明。特别地,我们讨论最近开发的介电依赖性混合功能的性能,提供了与许多身体GW计算结果的比较,包括G(0)W(0)以及更精细的方法,例如Quasiparticle Self-一致的gw。我们总结了最近的带隙的文献中的结果,表面处的带水平对准以及缺陷氧化物中的光学过渡能量,包括宽间隙氧化物半导体和过渡金属氧化物。还讨论了相关的过渡金属氧化物。对于每种方法,我们描述了成功和缺点,强调了改进理论方法的发展所面临的挑战。理论部分的前面是表征半导体的光电性能所需的主要实验技术的关键概述,包括吸收和反射光谱,光曝光和扫描隧道光谱(STS)。

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