首页> 外文期刊>Journal of nanoscience and nanotechnology >Solar-Blind Photodetector with Lower Dark Current and Higher I-light/I-dark Ratio Based on Mg0.38Zn0.62O Film Deposited by Pulsed Laser Deposition Method
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Solar-Blind Photodetector with Lower Dark Current and Higher I-light/I-dark Ratio Based on Mg0.38Zn0.62O Film Deposited by Pulsed Laser Deposition Method

机译:基于Mg0.38Zn0.62O薄膜沉积的脉冲激光沉积法,太阳盲光电探测器具有较低的暗电流和较高的I光/ I暗比率

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摘要

In this study, pulsed laser deposition method (PLD) was employed to grow MgxZn1-xO films on quartz substrates. The optimal deposition temperature of 300 degrees C for MgxZn1-xO film was decided and Mg0.38Zn0.62O, Mg0.56Zn0.44O and Mg0.69Zn0.31O films were grown respectively using MgxZn1-xO targets with different Mg contents (x = 0.3, 0.5 and 0.7). As-deposited Mg0.38Zn0.62O film possessed the mixed-phase (hexagonal and cubic phase) structure, appropriate band gap of 4.68 eV and smaller surface roughness of 1.72 nm, and the solar-blind photodetector (PD) based on it was fabricated. The key features of our PD are the cutoff wavelength of 265 nm lying in solar-blind band, lower dark current (I-dark) of 88 pA, higher peak responsivity of 0.10 A/W and bigger I-light/I-dark ratio of 1688, which provide the new idea for the application of solar-blind PDs based on MgxZn1-xO films.
机译:在该研究中,采用脉冲激光沉积方法(PLD)在石英底物上生长MgxZn1-XO膜。 确定MgxZN1-XO膜300摄氏度的最佳沉积温度,并使用MgxZN1-XO靶产生不同的Mg含量的Mg0.38Zn0.62O,Mg0.56Zn0.4O和Mg0.69Zn0.3 1O膜(x = 0.3 ,0.5和0.7)。 沉积的Mg0.38Zn0.62O薄膜具有混合相(六边形和立方相)结构,适当的带隙为4.68eV和1.72nm的表面粗糙度,以及基于其的太阳盲光电探测器(PD)制造 。 我们的PD的关键特征是太阳盲带中的265 nm的截止波长,较低的暗电流(i-暗)为88Pa,峰值响应率为0.10 A / W和更大的I光/ I暗比率 1688年,为基于MGXZN1-XO薄膜的应用太阳盲PDS提供了新的思路。

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