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High carrier mobility in quasi-suspended few-layer graphene on printed graphene oxide layers

机译:在印刷的石墨烯氧化物层上的准悬浮的少数层石墨烯中的高载流子迁移率

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摘要

Heterostructures of graphene (G) or multilayer graphene (MLG) transferred on the graphene oxide (GO) printed layer are considered in the present study. Hillocks with a height of about 60-100 nm are found at the background GO relief of 10-15 nm. Graphene in these heterostructures completely follows the GO relief. The quasi-suspended layers on the hillocks are observed for MLG, and the distance between MLG and GO is estimated up to 20-40 nm. An increase in the MLG thickness is suggested to increase the distance between MLG and GO. Carrier mobility in G/GO heterostructures is found to equal 300-500 cm(2)/V s. The formation of quasi-suspended MLG/GO structures leads to an increase in the carrier mobility up to 4500 cm(2)/V s with an increase in the MLG thickness (3-8 nm). The change in the carrier mobility in MLG as a function of voltage sweep direction is also observed. The effect is supposedly connected with the ability of the quasi-suspended layer to corrugate under the gate voltage application. The capsulation of heterostructures using GO films leads to the carrier mobility degradation to 300-500 cm(2)/V s in one-four weeks. The quasi-suspended structures are promising for flexible and/or printed electronics at the use as graphene channels for sensors, detectors and other applications.
机译:石墨烯(G)或多层石墨烯(MLG)的异质结构转印在氧化石墨烯(GO)印刷层是在本研究中考虑。具有约60-100纳米的高度小丘在10-15纳米的背景GO浮雕中找到。石墨烯在这些异质结构完全遵循GO救济。在小丘准悬浮层观察MLG,和估计MLG和GO之间的距离可达20-40纳米。在MLG厚度的增加,建议增加MLG和GO之间的距离。在G / GO异质流子迁移率被发现等于300-500厘米(2)/ V秒。准悬浮MLG / GO结构引线的增加,载流子迁移高达4500厘米(2)/ V s的增加在MLG厚度(3-8纳米)的形成。在MLG的载流子迁移的电压扫描方向的函数的变化,也观察到。效果据说与准悬浮层的栅极电压施加到下起皱的能力相连接。使用GO膜导致载流子迁移降解300-500厘米(2)/ V S IN一4周异质结构的封装。准悬浮结构在使用石墨烯通道传感器,检测器和其它应用有希望用于柔性的和/或印刷电子。

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  • 来源
    《Journal of Materials Science》 |2017年第17期|共7页
  • 作者单位

    RAS Rzhanov Inst Semicond Phys SB 13 Prospect Lavrentieva Novosibirsk 630090 Russia;

    Novosibirsk State Tech Univ 20 Prospect K Marksa Novosibirsk 630073 Russia;

    RAS Rzhanov Inst Semicond Phys SB 13 Prospect Lavrentieva Novosibirsk 630090 Russia;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
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