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首页> 外文期刊>Journal of Electronic Materials >Electron-Phonon Scattering in AlAs and Its Response to Hydrostatic Pressure
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Electron-Phonon Scattering in AlAs and Its Response to Hydrostatic Pressure

机译:在ALA中的电子 - 声子散射及其对静水压力的反应

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摘要

We perform first principles calculations to predict the electron-phonon (e-ph) scattering rates in AlAs and their dependence on phonon modes at energies close to the conduction band minima (CBM), as well as high into the conduction band. We then study the effect of hydrostatic pressure on the e-ph scattering in AlAs for pressures up to similar to 8.77 GPa. The effect of such pressures on the electronic structure and phonon dispersion is well documented. In AlAs, the bandgap becomes smaller, whereas the effect on phonon dispersion is to shift the optical phonon bands to higher frequencies and the acoustic branches to lower frequencies. In light of this, we explore the effect of hydrostatic pressure on the resulting scattering rates with increasing pressure along the high symmetry L - Gamma - X path. The results suggest that hydrostatic pressure does not significantly affect electron-phonon scattering rate.
机译:我们执行第一个原理计算以预测ALA中的电子 - 声子(E-PH)散射速率及其对靠近导电带最小值(CBM)的能量的依赖性的依赖性,以及高进入导通带。 然后,我们研究静水压力对铝中的e-pH散射的影响,以达到与8.77GPa相似的压力。 这种压力对电子结构和声子分散的影响很好地记录。 在ALAS中,带隙变小,而对声子色散的影响是将光学声子带偏移到较高的频率,并且声学分支到较低频率。 鉴于此,我们探讨了静水压力对沿着高对称L - &GT的压力增加的散射速率的影响。 伽玛 - & x路径。 结果表明,静水压压力不会显着影响电子 - 声子散射速率。

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