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首页> 外文期刊>Journal of Electronic Materials >Chemo-thermo-mechanically Coupled Crystal Plasticity Simulation of Stress Evolution in Thermally Strained -Sn Films
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Chemo-thermo-mechanically Coupled Crystal Plasticity Simulation of Stress Evolution in Thermally Strained -Sn Films

机译:热应变薄膜应力进化的化学热机械耦合晶体塑性模拟

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摘要

Whisker formation in tin films is a mode of stress relaxation, but the exact conditions causing them are yet to be established. In this work, a three-dimensional full-field chemo-thermo-mechanically coupled crystal plasticity simulation of thermally strained tin films was performed to evaluate the stress evolution and connect it to the redistribution of vacancies. Spatial heterogeneity in the hydrostatic stress along the grain boundary network (that served as the primary conduit for mass transport) was observed, which became more homogeneous towards the film surface. Normal and shear tractions on the columnar grain boundaries were evaluated as they might be crucial to breaking of the oxide layer (formed on the film surface) especially when inclined grain boundaries are present. With such an advanced multi-physics framework, several crystallographic and geometrical factors influencing whisker formation can be analyzed thereby leading to a better understanding of the factors modulating the nucleation and growth of such whiskers.
机译:锡膜中的晶须形成是一种应力松弛模式,但导致它们的确切条件尚未建立。在这项工作中,进行了三维全场化学热机械耦合的热应变锡膜的化学热机械耦合晶体塑性模拟,以评估应力进化并将其连接到空位的再分配。观察到沿晶粒边界网络的静压应力(用作大规模转运的主要导管)的空间异质性,其朝向膜表面变得更加均匀。评估柱状晶界的正常和剪切阶段,因为它们可能对破碎氧化物层(在薄膜表面上形成)至关重要,特别是当存在倾斜的晶界时。利用这种先进的多物理框架,可以分析几种影响晶须形成的晶须和几何因素,从而更好地了解调节这种晶须的成核和生长的因素。

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