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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >On annealing induced effect in optical properties of amorphous GeSeSn chalcogenide films for optoelectronic applications
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On annealing induced effect in optical properties of amorphous GeSeSn chalcogenide films for optoelectronic applications

机译:关于无定形Gesesn硫族化物薄膜光学性质的退火诱导效果,用于光电应用

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摘要

Thin films of GeSeSn were deposited by an evaporation technique. The X-ray diffraction studies demonstrate that the as-deposited and annealed films are amorphous in nature. Some optical constants were calculated for these films at an annealing temperature of 373 and 473 K. Dispersion of the refractive index is described utilizing the single oscillator model. In addition, the third-order nonlinear susceptibility and the nonlinear refractive index are calculated. The absorption coefficient of these films revealed an indirect optical band gap with a value of 1.03 eV, which is slightly increased by annealing. Also, it is found that the annealing decreases the width of the tail of localized states indicating a decrease in the disorder in GeSeSn films. (C) 2017 Elsevier B.V. All rights reserved.
机译:通过蒸发技术沉积Gesesn的薄膜。 X射线衍射研究表明,沉积的和退火薄膜本质上是无定形的。 在373和473k的退火温度下计算一些光学常数,用于在373和473k的退火温度下进行。利用单个振荡器模型描述折射率的分散。 另外,计算三阶非线性敏感性和非线性折射率。 这些薄膜的吸收系数揭示了间接光带间隙,其值为1.03eV,通过退火略微增加。 而且,发现退火减少了局部状态尾的宽度,这表明导致导致膜中的病症减少。 (c)2017年Elsevier B.V.保留所有权利。

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