首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Effect of electric current on grain orientation and mechanical properties of Cu-Sn intermetallic compounds joints
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Effect of electric current on grain orientation and mechanical properties of Cu-Sn intermetallic compounds joints

机译:电流对Cu-Sn金属间化合物接头晶体取向和力学性能的影响

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摘要

Electric current-assisted bonding experiments have been performed on Cu/Sn/Cu joints using an electric current density of 2.0 x 10(2) A/cm(2) at 260 degrees C. The effect of electric current on the grain orientation of Cu -Sn mtermetallic compounds (IMCs) and mechanical properties of Cu/Sn/Cu joints were evaluated. The scanning electron microscopy (SEM) observation indicated that the electric current had obvious polarity effect on Cu6Sn5 growth. The Electron backscatter diffraction (EBSD) analysis revealed that Cu6Sn5 showed a preferred orientation of [0001] direction being parallel to the electric current. On the contrary, the morphology and grain orientation of Cu3Sn were barely influenced under the electric current density of 2.0 x 10(2) A/cm(2). The calculation results indicated that the Cu(6)Sn(5)5 (0001) plane showed the lowest projection atomic density of 27.9 atoms/nm(2). Therefore, the C(6)SS(5)s grams with their [0001] directions oriented along electric current could grow faster because of smaller electron wind force and greater Cu atom flux. The results of nanoindentation experiment and shear test also proved that the full-C(6)gS(5)s joints formed under electric current had lower Youn's modulus mismatch between Cu6Sn5 and Cu3Sn, and had a joint shear strength of44.87 MPa. The present work offers a method to adjust the texture of Cu -Sn IMCs in the joints for achieving better electrical and mechanical properties. (C) 2018 Elsevier B.V. All rights reserved.
机译:在260℃下使用2.0×10(2)A / cm(2)的电流密度在Cu / Sn / Cu接头上进行电流辅助粘合实验。电流对Cu晶粒取向的影响-SN Metermetallic化合物(IMC)和Cu / Sn / Cu接头的机械性能进行评估。扫描电子显微镜(SEM)观察结果表明电流对Cu6SN5生长具有明显的极性效应。电子反向散射衍射(EBSD)分析显示CU6SN5显示了与电流平行的方向的优选取向。相反,Cu3Sn的形态和晶粒取向在2.0×10(2)A / cm(2)的电流密度下几乎影响。计算结果表明,Cu(6)Sn(5)5(5)5(0001)平面显示出最低投影原子密度为27.9原子/ nm(2)。因此,由于电子风力较小和更高的Cu原子通量,C(6)SS(5)克具有沿电流的方向沿着电流定向的方向可以生长得更快。纳米狭窄实验和剪切测试的结果还证明了在电流下形成的全-C(6)GS(5)克接头在Cu6SN5和Cu3Sn之间具有较低的Youn的模量失配,并且具有44.87MPa的关节剪切强度。本工作提供了一种方法来调节关节中Cu -SN IMC的质地,以实现更好的电气和机械性能。 (c)2018年elestvier b.v.保留所有权利。

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