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Grain growth kinetics and electrical properties of CuO doped SnO2-based varistors

机译:CUO掺杂SnO2基压敏电阻的晶粒生长动力学和电学性能

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摘要

Up to now, attempts for developing coarse-grained SnO2-based varistors which exhibit high nonlinearity property at lower voltage have become a challenge without any prominent result because of its unknown grain growth mechanism. In this study, the effect of CuO addition to SnO2-based varistors as a grain growth enhancer additive on microstructural development, grain growth kinetics, and electrical properties was investigated. The characterization of grain growth kinetics showed that CuO addition encouraged grain growth and enhanced the grains size as it could be seen in the activation energy which decreased from 594 kJ/mol to 364 kJ/mol. In the samples with a low amount of CuO, the solute drag force is the controlling mechanism of grain growth. By further addition, the mechanism changed to the Sn4+ solution-precipitation in CuO-rich liquid phase. Also, the electrical properties of CuO doped samples showed that they are so promising for low voltage applications. (C) 2018 Elsevier B.V. All rights reserved.
机译:到目前为止,尝试开发粗粒粒子的SnO2的压敏电阻,其在较低电压下表现出高的非线性性能已经成为没有任何突出结果的挑战,因为其未知的晶粒生长机制。在该研究中,研究了CUO除基于SnO2的压敏电阻的影响,作为微观结构发育的晶粒生长增强剂添加剂,晶粒生长动力学和电性能。谷物生长动力学的表征表明,CuO添加了谷粒生长,增强了晶粒尺寸,因为它可以在激活能量中看到,从594 kJ / mol降低至364kJ / mol。在具有少量CuO的样品中,溶质阻力是晶粒生长的控制机制。通过进一步添加,该机制在富含CuO的液相中改变为SN4 +溶液沉淀。而且,CuO掺杂样品的电特性表明它们是对低电压应用的承诺。 (c)2018年elestvier b.v.保留所有权利。

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