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首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Structural and superconducting properties of Nb3Sn films grown by multilayer sequential magnetron sputtering
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Structural and superconducting properties of Nb3Sn films grown by multilayer sequential magnetron sputtering

机译:多层顺序磁控溅射生长Nb3Sn膜的结构和超导特性

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Nb3Sn thin films are fabricated by sequential sputtering followed by annealing at 850-1200 degrees C in vacuum. The effects of the annealing temperature and time on the formation of Nb3Sn were examined. The film crystal structure, morphology, surface topography and composition were characterized by X-ray diffraction, field-emission scanning electron microscopy, atomic force microscopy, and energy dispersive X-ray spectroscopy analysis. The superconducting properties of the films were characterized by measuring the surface resistivity by the four-point probe method. The highest critical temperature T-c = 17.86 K was observed for the Nb3Sn films annealed at 950 degrees C for 3 h. When the films were annealed above 1000 degrees C for 3 h, Sn evaporation resulted in a Nb-rich film, degrading the superconducting performance. Annealing at 1200 degrees C for 3 h resulted in evaporation of Sn leaving less than 1% Sn on the surface, as detected by energy dispersive spectroscopy, and for that film a T-c of 7.9 K was observed. (C) 2019 Elsevier B.V. All rights reserved.
机译:的Nb 3 Sn薄膜通过溅射顺序进行退火在850-1200℃的真空中制造。检查了退火温度和时间上的Nb 3 Sn的形成的影响。通过X射线衍射,场发射扫描电子显微镜,原子力显微镜和能量分散型X射线能谱分析所述膜的晶体结构,形态,表面形貌和组成进行了表征。由通过四点探针法测量表面电阻率的膜的超导特性进行了表征。最高临界温度T-C = 17.86 K的观察到在950℃下退火3小时的Nb 3 Sn膜。当膜高于1000摄氏度退火3小时,蒸发的Sn导致富含Nb膜,从而降低超导性能。在1200摄氏度退火3小时导致的Sn的剩下不到1%的Sn的表面上,通过能量分散光谱法检测到的蒸发,以及该膜中观察到7.9 K的T-C。 (c)2019 Elsevier B.v.保留所有权利。

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