机译:TiO2掺入的溅射衍生HFO2薄膜溅射衍生HFO2薄膜的微观结构优化和光学界面性能调制
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
Anhui Univ Chinese Med Affiliated Hosp 1 Dept Pharm Hefei 230031 Peoples R China;
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
Chinese Acad Sci Shanghai Inst Tech Phys Natl Lab Infrared Phys Shanghai 200083 Peoples R China;
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
Hefei Normal Univ Dept Phys &
Elect Engn Hefei 230061 Peoples R China;
Anhui Univ Sch Phys &
Mat Sci Radiat Detect Mat &
Devices Lab Hefei 230601 Peoples R China;
High-k gate dielectrics; TiO2-doped HfO2; RF sputtering; Optical constant;
机译:TiO2掺入的溅射衍生HFO2薄膜溅射衍生HFO2薄膜的微观结构优化和光学界面性能调制
机译:氧分压对溅射态非晶InGaZnO薄膜光学和电学性质的调制
机译:氧分压对微晶,光学性质,残余应力和激光诱导无定形HFO2薄膜的影响
机译:斜角沉积Sm3 +掺杂TiO2薄膜的微观结构和光学性能
机译:尺寸和界面效应对固体薄膜和微结构的热物理性质的影响。
机译:等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
机译:各种纹理NiO薄膜的生长,界面微观结构和光学性质