首页> 外文期刊>Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics >Electrical and optical properties of annealed AlSnZnO films deposited using radio frequency magnetron cosputtering system
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Electrical and optical properties of annealed AlSnZnO films deposited using radio frequency magnetron cosputtering system

机译:使用射频磁控腐蚀系统沉积退火的Alsnzno薄膜的电气和光学性能

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摘要

Using a dual aluminum zinc oxide (AZO) target and tin dioxide (SnO2) target, 200-nm-thick aluminum-tin-zinc-oxide (ATZO) films were deposited onto quartz substrates by a radio frequency magnetron cosputtering system. After measuring X-ray diffraction patterns, carrier concentration, carrier mobility, room-temperature photoluminescence spectra, and ultraviolet-visible-near infrared spectra of the ATZO films without and with thermal annealing treatment in an oxygen ambience for 10 min at various temperatures, the annealing effects were demonstrated. Correlations among crystalline structures, electrical properties, optical properties, and annealing temperatures were observed. As the annealing temperature increased from 200 degrees C to 300 degrees C, the atoms of ATZO films gained more kinetic energy and more surface mobility to occupy stable positions. However, by further increasing the annealing temperature to 400 degrees C, the bonds in ATZO films became broken rather than enabling the atoms to remain in their corresponding stable positions. Consequently, the best properties were obtained for ATZO films annealed at 300 degrees C. (C) 2020 Elsevier B.V. All rights reserved.
机译:使用双铝氧化锌(AZO)靶标和二氧化锡(SNO2)靶标,通过射频磁控凝固系统沉积在石英基板上的200-Nm厚的铝 - 锡锌 - 氧化物(ATZO)膜。在测量X射线衍射图案,载体浓度,载流子迁移率,室温光致发光光谱和奥佐膜的紫外线可见近红外光谱,在各种温度下在氧气氛围中进行热退火处理10分钟,对退火效果进行了证明。观察结晶结构,电性能,光学性质和退火温度之间的相关性。随着退火温度从200摄氏度增加至300℃,ATZO膜的原子获得了更多的动能和更具表面迁移率以占据稳定的位置。然而,通过进一步将退火温度进一步增加至400℃,atzo薄膜中的键变为破损而不是使原子保持在其相应的稳定位置。因此,在300度C.(c)2020 Elsevier B.V的Atzo薄膜中获得了最佳性质。

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