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首页> 外文期刊>Journal of Applied Polymer Science >Sol-gel preparation of ultralow refractive index silica coatings with hydroxypropyl-beta-cyclodextrin as porogen
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Sol-gel preparation of ultralow refractive index silica coatings with hydroxypropyl-beta-cyclodextrin as porogen

机译:用羟丙基 - β-环糊精的超级折射率二氧化硅涂层作为孔剂的溶胶 - 凝胶制备

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摘要

Ultralow refractive index films were prepared based on a base-catalyzed sol-gel process using methyltriethoxysilane (MTES), tetraethylorthosilicate (TEOS) as co-precursors, and hydroxypropyl-beta-cyclodextrin (HPCD) as porogen. After further modification by hexamethylisilazane (HMDS), the lowest refractive index of these silica coatings obtained from the hybrid sol was 1.05 and the static water contact angles of the coatings increased from 66.4 degrees to 128.7 degrees. The effect of weight ratio of HPCD to SiO2 on the refractive index and on the formation of coating films were systematically studied. The data showed that the films prepared with HPCD as porogen got a pore diameter around 4 nm. Compared with those templates such as poloxamer (F127), HPCD not only perform well in decreasing the refractive index of films, but also eliminate light scattering caused by mesopore of the film, will have potential value in the field of surfactant-templated methods. (C) 2016 Wiley Periodicals, Inc.
机译:基于使用甲基三乙氧基硅烷(MTE),四乙基硅酸盐(TEOS)作为共前体和羟丙基 - β-环糊精(HPCD)作为致孔剂,基于碱催化的溶胶 - 凝胶工艺制备超低折射率薄膜。在通过六甲基硅氮烷(HMDS)进一步改性之后,从杂交溶胶中获得的这些二氧化硅涂层的最低折射率为1.05,涂层的静态水接触角度从66.4度增加到128.7度。系统地研究了HPCD对SiO 2对折射率和涂膜形成的影响。数据显示,用HPCD制备的薄膜作为孔剂的孔径约为4nm。与诸如泊洛克敏(F127)的模板相比,HPCD不仅在降低薄膜的折射率时表现良好,而且还消除由膜的中孔引起的光散射,在表面活性剂模板的方法领域将具有潜在的值。 (c)2016 Wiley期刊,Inc。

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