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首页> 外文期刊>Surface & Coatings Technology >Anticorrosive yet conductive Hf/Si3N4 multilayer coatings on AZ91D magnesium alloy by magnetron sputtering
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Anticorrosive yet conductive Hf/Si3N4 multilayer coatings on AZ91D magnesium alloy by magnetron sputtering

机译:通过磁控溅射在AZ91D镁合金上的防腐又导电HF / Si3N4多层涂层

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Hafnium monolayer and Hf/Si3N4 multilayer coatings were deposited on AZ91D magnesium alloys via magnetron sputtering. The microstructure, conductivity and corrosion behaviors of these coatings were investigated. It was found that the columnar growth of the Hf sublayer was suppressed in the Hf/Si3N4 multilayer coating. This multilayered structure resulted in the relief of residual stress and the decrease in porosity. These changes in microstructure inhibited the permeation of corrosion media into the substrate and decreased the diffusion rates of corrosion products. The Hf/Si3N4 multilayer coatings with 10 bilayers showed the best anticorrosion performance revealed by the lowest corrosion current density of 2.798 mu A/cm(2) in electrochemical system and the smallest corrosion area of 0.22% after 48 h salt spray test, respectively. Additionally, the introduction of Si3N4 sublayer has little impact on the conductivity of the multilayer coating due to the shadowing effect during the deposition. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过磁控溅射在AZ91D镁合金上沉积铪单层和HF / Si3N4多层涂层。研究了这些涂层的微观结构,导电性和腐蚀行为。发现HF子层的柱状生长在HF / Si3N4多层涂层中抑制。这种多层结构导致缓解残余应力和孔隙率降低。微观结构的这些变化抑制了腐蚀介质进入基材中的渗透并降低了腐蚀产物的扩散速率。具有10个双层的HF / Si3N4多层涂层显示出通过电化学系统中最低腐蚀电流密度的最低腐蚀电流密度和48h盐喷雾试验后的最低腐蚀电流密度和0.22%的最小腐蚀面积的最佳防腐性能。另外,由于在沉积期间,Si3N4子层的引入对多层涂层的电导率影响几乎没有影响。 (c)2016 Elsevier B.v.保留所有权利。

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